Characteristic Distributions of Narrow Channel Metal-Oxide-Semiconductor Field-Effect-Transistor Memories with Silicon Nanocrystal Floating Gates ; Eiji Nagata, Nobuyoshi Takahashi, Yuri Yasuda, Takashi Inukai, Hiroki Ishikuro, and Toshiro Hiramoto ; Japanese Journal of Applied Physics ; ; ; V.38/No.12B/P.7230 – 7232 ; 1999/12?
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