Fabrication of Gate-All Around MOSFET by Silicon Anisotropic Etching Technique ; T. Mukaiyama, K. Saito, H. Ishikuro, M. Takamiya, T. Saraya, and T. Hiramoto ; Solid State Electronics ; ; ; V.42/No.7-8/P.1623 – 1626 ; 1998/06?
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